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Design Features


Postlayout EDA tools lock onto full-chip verification

Jim Lipman, Technical Editor


  During chip design, you perform many design validations. However, the checks that follow final chip placement and routing are, perhaps, the most critical. It is at that point that you can most accurately model final chip performance, including all interconnect wiring parasitics. Emerging postlayout-verification tools and design methodology have increased in scope and complexity, along with the chips on which you use them, and emerging EDA companies are responding with tools that address expanding postlayout verification needs.

  Traditional postlayout verification consists of three tests: a design-rule check (DRC) to confirm that physical layout follows the constraints set by the chip-fabrication process; an electrical-rules check (ERC) that looks for simple problems, such as open nodes and transistor shorts; and a final performance simulation that uses interconnect RC parasitics that are back-annotated from the layout into a timing simulator. But, deep-submicron processes and on-chip clocks of more than 100 MHz require verifications that are more accurate, run faster, and can cover an entire chip—not just a portion of it. Many of today's deep-submicron chips need checking beyond physical design rules and timing delays. Signal integrity (SI), power dissipation, and reliability are also potential problems, due to higher chip density and faster clock rates.

  High-speed chips result in signals that often appear more analog than digital. This situation means that you have to check not only the delay of a signal from Point A to Point B, but also the signal's quality, or integrity, as well. Degraded rise and fall times, ringing, reflections, ground bounce, and VDD degradation are some of the SI problems that occur in chips with clock rates of 40 MHz or higher (Reference 1).

  Power-related problems are also on the rise. These problems include not only a chip's total power dissipation, but also the distribution of power across the chip. Sharp discontinuities in dissipation can result in "hot spots" (local high-temperature areas) that can lead to degraded performance of nearby logic blocks or, for mixed-signal chips, analog circuits. Because most of a chip's power is dynamic, verification tools that estimate power dissipation must take into account input-activity level, using the proper test vectors.

  Long-term reliability due to potential electromigration problems is another issue to consider. Over time, excessive current density in a chip's metal interconnect causes the metal to deteriorate at the point at which the current density is highest, the place with the smallest cross-section. Removing metal atoms from that location decreases the cross-section, causing current density to further increase, and, eventually, the line opens.

  Increasing chip density and speed also cause problems by limiting verification-tool capacity. Design databases for deep-submicron chips can be on the order of tens of gigabytes, much of it a result of parasitic extraction and analysis. This size taxes the storage and memory requirements of most computing platforms.

  To eliminate analysis and detailed extraction on unimportant nets, verification tools need to filter extracted data. These tools also need to operate in an incremental mode, checking changes only when you make modifications after a prior verification. Parasitic RC-reduction software, either as a standalone tool or as part of a verification tool, is available from companies such as Avanti, Epic, Mentor Graphics, Simplex Solutions, and Ultima (Table 1). These tools can help but with a loss of extraction accuracy (Table 2). For your most aggressive designs, you still need to have EDA tools that can help manage a design database and that have the muscle to work on 1 million-plus transistor chips.

The heart of verification

  Before you analyze a postlayout chip file, you have to extract information from the file, which is usually in Graphic Design System II (GDSII) format but may also be in CalTech Intermediate Format (CIF) (see box, "Alphabet soup"). To get parasitic resistance and capacitance, and, ultimately, interconnect-delay information, you need an RC-extraction tool. You can do extraction with a dedicated EDA tool or with one that is part of a tool designed for additional analysis, such as a timing verifier. In addition, to obtain current-flow or power estimation, you need to extract the chip's transistors. You also use the extracted netlist to compare the layout to a logical description (netlist) of the chip, sometimes called the LVS (layout-vs-schematic) check. An LVS verification makes sure that the circuit layout you have is equivalent to the logical circuit representation used to derive the layout.

 Parasitic extraction is a key part of postlayout verification. As fabrication technology shrinks below approximately 0.8 mm, the delays on a chip due to interconnect begin to dominate the intrinsic delays of the driving transistors (Figure 1). Smaller chips mean more complex equivalent-RC circuits for the interconnects between transistors. In the past, you could ignore the resistance of an interconnect wire and just take the overlap capacitance of the wire to either the substrate (ac ground) or another wire to calculate the wire's load.

Deep-submicron technology greatly complicates this task. Wire resistance is now an important parameter because thinner and narrower wires, a by-product of shrinking processes, have more resistance than taller, fatter wires. The higher resistance increases the net's load, thus increasing signal delay and skew. Now, you must perform accurate 3-D capacitance extraction. You need an interconnect wire's width and length to calculate overlap capacitance to the wires above and below the interconnect wire. You also need the interconnect's height (thickness) and distance from other wires on the same layer to compute lateral capacitance. Finally, you need to consider fringe capacitance, which is a component added to overlap capacitance (Figure 2).

  State-of-the-art chip processes are also adding more metal wiring layers. A few years ago, you used just two or three layers. Now, you have as many as five or six layers, which further complicates the parasitic-extraction operation.

  There is a trade-off between 2- and 3-D-parameter extraction: the speed of the extraction process vs the accuracy of the extracted data. True 3-D extraction takes too long to do on an entire chip, so you usually use it only on key areas. Frequency Technology describes a typical extraction methodology as consisting of three phases: a coarse (2-D) extraction tied to routing tools, a refined extraction used to prioritize critical nets, and a high-accuracy (3-D) extraction to examine those nets. What you define as a critical net is also important, but which nets to use is not completely obvious. Naturally, clock-distribution networks, or clock trees, are very important and may need very accurate extraction for high-speed chips. The same situation is true for mP computation engines. However, each chip design has its own definition of what are critical speed paths, and you need to recognize which paths are really critical to best determine where to apply the slower 3-D extractions (see box, "Speeding parasitic extraction").

Pumped-up verification tools

 Many new and established EDA companies now offer faster and better verification tools. Simplex Solutions' Fire & Ice and Thunder & Lightning are examples of a new breed of postlayout EDA tools that combine speed, capacity, and broad verification capability. The Simplex tools perform full-chip, 3-D extraction on 4 million-transistor circuits within 24 hours. Dynamic power verification and signal compliance take another 10 hours per 100 test vectors on the same chip. Fire & Ice is a tool that hierarchically extracts transistor and RC parasitics from a GDSII layout file. The tool calculates interconnect capacitance (including lumped, coupled, and distributed components) and resistance to within 5 to 10% that of measured silicon or that calculated by 3-D field solvers. Fire & Ice extracts area, lateral, and fringing capacitance in the presence of multiple surrounding bodies, increasing the accuracy of SI information.

  Thunder & Lightning provides power-grid, clock-tree, and SI verification. The tool uses vectors from a Verilog file to determine active power dissipation. Thunder & Lightning also supplies power-grid verification, including IR drop for supply-voltage degradation and current density for potential electromigration or power and ground-bounce problems. Together with Fire & Ice, Thunder & Lightning checks signal clock-skew compliance, coupling noise, and reliability analysis. Compliance testing includes rise and fall slew rates, signal glitches, setup and hold violations, and other SI problems.

One interesting variation of an existing type of EDA tool is Compass Design Automation's Laybool, an extension of its VFormal formal verification tool. You use traditional formal verification tools, from companies such as Abstract Hardware (Middlesex, UK), Chrysalis (North Billerica, MA), Compass, and Bell Labs Design Automation (Murray Hill, NJ), to compare different logical representations of a design. Formal verifiers compare RTL, gate-level netlist, or transistor-level netlist representations to determine if they are functionally equivalent. Laybool and VFormal go a step further by extracting the netlist from the layout, deriving the Boolean equivalence from the netlist and comparing the Boolean equivalence to the RTL representation of the same circuit (Figure 4). This capability lets you check whether the physical layout represents the same design you had at RTL.

  As chips become more complex and operate at higher speeds, the EDA-tool capabilities needed to verify the chips also grow. The scope of postlayout-verification tools is increasing in what they can do and the speed at which they run.

  After all the design implementation and verification steps leading to the final place and route, you need to integrate these tools into your design flow to assure that the layout you have does, indeed, represent your starting chip design.

Speeding parasitic extraction

  Fast parameter estimation is a requirement for full-chip parameter extraction. Tool vendors have special techniques for speeding verification. Two methods for fast capacitance estimation are analytical and table-look-up models. Both methods are based on numerical simulations of possible layout structures used for a given process technology. With table look-up, memory requirements grow rapidly with an increase in the number of parameters needed to describe a particular structure. This makes table look-up impractical for large chips with many metal layers. (Current deep-submicron processes can have as many as six layers.) Analytical models execute quickly, providing faster extraction but require sophisticated model development, because the variation of capacitances, with respect to layout parameters, can be very complex. However, for a given technology process, parameters are fixed (within a tolerance limit), and most interconnect-layout parameters, such as line width and spacing, vary within a limited range. Tool vendors using an analytical-modeling approach for capacitance estimation can, therefore, develop accurate models for the most commonly used layout configurations that are within a few percentage points of exact numerical values.

  Another technique for increasing parameter-extraction speed with reasonable accuracy is to use a quasi-3-D technique. Epic Design Technology's approach is to combine two 2-D views of the same object. Epic's Arcadia (Figure 3) models capacitance using two orthogonal sides of a vertical plane (front and side) to save processing time. Arcadia also has multiple extraction modes. Arcadia combines the quasi 3-D technique with an empirical capacitance extractor and a link to TMA's Raphael, a high-accuracy 3-D field solver. Multiple extraction modes let you make accuracy vs speed tradeoffs for your design. For interconnect-resistance extraction, Arcadia has a pattern library and library-matching technique. The company uses a 2-D field solver to create a library of interconnect configurations for resistance values. When Arcadia extracts a pattern, it looks in the pattern library for a match. If the tool can't find a match, it uses the field solver and adds the solution to the library. Because pattern matching is faster than using a field solver exclusively, this speeds extraction time.

Table 1—Representative full-chip, postlayout-verification, and 3-D-extractor tool vendors

Company Tool Function3 Input files3 Output files3 2- or 3-D extractor? Accuracy vs Spice Workstation or PC platform? Price1 Comments
Anagram ADM RCX, Clk, Pwr, Tim, SI, Elmig Spice, DSPF Spice Within 5% Workstation $55,000 Interfaces with third-party 2- and 3-D extractors
Avanti Star Hercules RCX, DevX, RCred, Clk, Tim, SI GDSII, CIF Spice, SPF, SDF 3-D Workstation $125,000 to $160,000
DRC, ERC, LVS GDSII, CIF, EDIF, Verilog, Spice Workstation $30,000 to $200,000 Distributed-processing option
Cadence Design Systems Dracula DRC, ERC, LVS, RCX, DevX, Tim, SI Spice, CDL, Verilog, Tegas, CIF, GDSII, EDIF, Internal Spice, DSPF, RSPF 2-D Within 2% Workstation $25,000
Diva DRC, ERC, LVS, RCX, DevX, Tim, SI Internal Extracted view Both Within 2% of Spice Workstation $12,000
Compass Design Laybool Layout vs RTL Spice, CDL, EDIF Verilog, VHDL, EDIF Workstation $150,000 Extracts Boolean equations from
Chiptime Tim EDIF, Verilog, VHDL, DEF Timing reports, SDF Within 10% of Spice Workstation $30,000 Automation with VFormal
Physical-verification tool set DRC, ERC, LVS, RCX, DevX, Clk, Tim CIF, GDSII, VHDL, Verilog, EDIF, DEF, DSPF, netlists EDIF, Spice, DEF, SDF, SPF, Internal 2-D Within 5% of Spice Workstation $60,000 plus options Includes bonding diagram editor
Epic Design Technology Arcadia RCX, DevX GDSII, Spice, DSPF, Proc SDF, Spice, SPF, Internal Quasi 3-D Workstation $24,400 Arcadia has a link with
PathMill RCred, Clk, Tim, SI Spice, DSDF, Proc SDF, Spice, SPF, Internal Workstation $36,400 TMA's Raphael for 3-D
PowerMill RCred, Pwr Spice, DSDF, Proc SDF, Spice, SPF, Internal Workstation $60,100 capacitance extraction
RailMill RCred, Elmig Spice, DSDF, Proc SDF, Spice, SPF, Internal Workstation $132,800
TimeMill RCred, Tim, SI Spice, DSDF, Proc SDF, Spice, SPF, Internal Workstation $44,600
High Level Design Systems HyperExtract RCX Physical libraries, Proc, LEF/DEF SPF, DSPF, SPEF 2-D Within 10% of Spice Workstation $59,000 Extendable to 2.5-D with interfaces to third-party field solvers
Fasnet RCX Timing libraries, design database, Proc SDF Within 4% of Spice Workstation Dependent on configuration
Lucent Technologies Clover DRC, ERC, LVS, DevX, RCX, Rcred GDSII, Spice, DSPF, Proc Spice, DSPF, RSPF 2-D Within 5% of Spice Workstation $50,000 to $200,000 Interface to third-party, single-net, 3-D extractors
Mentor Graphics Calibre DRC, ERC, LVS, DevX GDSII, Spice, SVRF, Proc GDSII, text Workstation $40,0002 to $75,000
XCalibre RCX, DevX, RCred, Tim GDSII, SVRF, Proc Spice, SPF, SDF, Text Both Typically, 5% of 3-D solution Workstation $60,000 (full-chip extract) $40,000 (delay calculator)
OEA International P-Grid Pwr, Elmig GDSII, Proc Graphic display 3-D Workstation $75,000
Net-AN RCX, Clk, SI GDSII, LEF, DEF, Proc Spice, DSPF, SDF, Graphic display 3-D Workstation $75,000
Metal and PLWS RCX, DevX, SI GDSII, CIF, DXF Spice Both Workstation $19,000 for both Used to model and characterize interconnect parasitics
OptEM Engineering OptEM Inspector ERC, LVS, RCX, DevX, RCred, Clk, SI GDSII, Proc SPF, Spice Both Comparable to Spice Both $70,000 Performs timing analysis with Spice
Quad Design Motive Some ERC, Clk, Tim Internal, Verilog, EDIF Timing reports/graphs 5 to 10% of Spice Both $36,000 Static-timing analyzer
Slam Some ERC, Some DRC, DevX, Clk, Tim Internal, Spice, Verilog, EDIF Timing reports/graphs 5 to 10% of Spice Both $65,000 Switch-level analyzer
Poet Some DRC, Some ERC, DevX, Clk, Pwr Internal, Spice, Verilog, EDIF Power reports/graphs 5 to 10% of Spice Both $15,000 Power evaluator
Simplex Solutions Fire & Ice ERC, RCX, DevX, RCred GDSII, Proc SPF, Spice 3-D Within 10% Workstation $150,000
Thunder & Lightning Clk, Pwr, Tim, Si, Elmig Spice, DSPF SDF, Spice of Spice Workstation $150,000
Tanner Research Tanner Tools DRC, LVS, RCX, DevX, Tim, SI GDSII, Spice GDSII, Spice 2-D Both $5,000 to $15,000 Tool suite also contains other ASIC-design and -layout tools
TMA Raphael Interconnect analysis for parasitic RCL models GDSII, Proc Spice, LPE capacitance models for Cadence Dracula and Avanti Star Both Workstation NA Solves for RCL, EM fields, current and temperature; used to model and characterize interconnect parasitics
Ultima Interconnect Technology Ultima-PR RCred Spice, DSPF Spice, DSPF Workstation $36,500
Ultima-PE RCX GDSII, LEF, DEF Spice, DSPF 3-D Within 2 to 5% of other solvers Workstation $49,500 Critical-net extraction; not full-chip extraction
1 Starting price unless otherwise noted.
2 $40,000 for flat DRC or flat LVS. $75,000 for hierarchical DRC or hierarchical LVS. Multiprocessor DRC prices start at $50,000.
3 See Table 1 on pg 98.

Table 1—Abbreviations and acronyms

CDL: Capacitance-driven layout Elmig: Electromigration analysis RCred: Parasitic RC reduction
CIF: CalTech Intermediate Format ERC: Electrical-rule check RCX: Interconnect RC extraction
Clk: Clock-tree analysis GDSII: Graphic Design System II RSPF: Reduced standard-parasitic format
DEF: Design-exchange format LEF: Library-exchange format SDF: Standard delay format
DevX: Device extraction LPE: Layout-parameter extraction SI: Signal-integrity analysis
DRC: Design-rule check (physical) LVS: Layout vs schematic (extracted) SPEF: Standard-parasitic extended format
DSPF: Detailed standard-parasitic format Proc: Process-technology file SPF: Standard-parasitic format
EDIF: Electronic Design Interchange Format Pwr: Power-grid/current-flow analysis Tim: Timing analysis

Representative full-chip, postlayout EDA-tool vendors

For free information on companies offering full-chip, postlayout design-verification tools and services, such as those described in this article, circle the appropriate numbers on the postage-paid Information Retrieval Service card or use EDN's Express Request service. When you contact any of the following manufacturers directly, please let them know you read about their products in EDN. Note: All Web addresses start with http:// unless otherwise noted.
Anagram
Sunnyvale, CA
(408) 720-7408
fax (408) 730-0877
www.anagraminc.com
Epic Design Technology
Sunnyvale, CA
(408) 988-2997
fax (408) 988-8324
www.epic.com
Mentor Graphics
Wilsonville, OR
(503) 685-7000
fax (503) 685-1282
www.mentorg.com
Simplex Solutions
San Jose, CA
(408) 432-8260
fax (408) 432-8262
www.simplex.com
Avanti
Sunnyvale, CA
(408) 738-8881
fax (919) 941-6700
www.avanticorp.com
Frequency Technology
Los Altos, CA
(415) 917-5800
fax (415) 917-5817
OEA International
Santa Clara, CA
(408) 738-5972
fax (408) 738-2017
Tanner Research
Pasadena, CA
(818) 792-3000
fax (818) 792-0300
www.tanner.com
Cadence Design Systems
San Jose, CA
(408) 943-1234
fax (408) 943-0513
www.cadence.com
High Level Design Systems
Santa Clara, CA
(408) 748-3456
fax (408) 748-3499
www.hlds.com
OptEM Engineering
Calgary, Canada
(403) 289-0499
fax (403) 282-1238
www.optem.com
TMA
Sunnyvale, CA
(408) 328-0930
fax (408) 328-0940
www.tmai.com
Compass Design
Automation
San Jose, CA
(408) 433-4880
fax (408) 434-7820
www.compass-da.com
Lucent Technologies
Allentown, PA
(908) 582-7546
fax (908) 582-5145
Quad Design
Camarillo, CA
(805) 988-8250
fax (805) 988-8259
Ultima Interconnect
Technology
Cupertino, CA
(408) 725-8700
fax (408) 725-0738

Table 2—Parasitic RC reduction

Reduction No. of R No. of C No. of RC Reduction (%) Error (%)
Original1 109,334 104,841 214,175
Default2 53,732 35,278 89,010 58.44 1.4
75% 27,818 25,495 53,313 75.11 1.8
80% 22,317 21,745 44,062 79.43 11
85% 15,252 18,500 33,753 84.24 16.3
1Original=214,175 RC elements and 32,759 external ports.
2All I/Os conserved (no external ports tightened together).
These values correspond to Ultima's Ultima-PR tool.

Alphabet soup

If you are confused by all the acronyms for back-end chip-design data formats, you're not alone. This list defines some of the more common ones and briefly explains what they mean.

CDL Capacitance-driven layout. CDL has more than one definition. This one refers to a layout tool that includes a capacitance estimate in its algorithm for creating layout data. (CDL can also mean Cadence design language, a Spicelike transistor-level netlist.)

CIF CalTech Intermediate Format. An ASCII format used to describe layout structures. Some EDA tools use CIF as an alternative to GDSII stream format. It is most commonly used by universities and VLSI customers. Some designers prefer it to GDSII stream format because it is human-readable, and you can modify it with a simple text editor.

DEF Design-exchange format. A format that captures both logical- and physical-design information. Design-specific logical data includes internal cell connectivity (netlist), cell grouping (hierarchy), timing parameters, path constraints, scan chains, and clock-tree information. Physical data includes cell placement and routing geometry.

DSPF Detailed standard-parasitic format. This format, defined by Cadence, is now in the public domain. The root format, SPF, looks very much like Spice. DSPF includes comments and a structure that make it easier to organize the netlist information into the original circuit with added information for RC trees. Most major players in the field of layout extraction support this syntax for describing RC trees, usually for Spice simulations.

EDIF Electronic Design Interchange Format. Provides the syntax and semantics for exchange of electronic-circuit information, consisting of circuit connectivity and related attributes, including schematic representation. EDIF also supports other structural levels, including system and pc-board connectivity, from an electrical, not physical, viewpoint.

GDSII Graphic Design System II. This is the "industry-standard" format used to capture physical-design data. Almost all polygon editors read and write this standard. Calma Corp defined the format when it introduced its GDSII layout editor; since that time, it has been extended many times.

LEF Library-exchange format. Place-and-route library physical-data format that includes ports and wiring-congestion information for routing tools. LEF captures data relative to the underlying process geometry, as well as "abstract" information relative to the library and intellectual property (IP), or cell data, for that process. Library and IP data contain a description of the underlying cell's physical, logical, power, and timing data that you typically find in a data book.

LPE Layout-parameter extraction. This term refers to the operation of computing and extracting key electrical parameters, such as active devices, parasitic capacitances, and diodes, from an IC layout. Different companies have different tools to perform this operation.

RSPF Reduced standard-parasitic format. RSPF replaces the RC trees used by DSPF with simpler models for drivers and loads. These models are most typically generated with a program that implements the asymptotic-waveform-evaluation (AWE) algorithm. You use RSPF in delay calculations.

SDF Standard delay format. You use this public-domain format, originally defined by Cadence, for back-annotating delay information from chip layout to VHDL or Verilog source code for more accurate timing simulation. You can also use SDF to forward-annotate timing constraints from a synthesizer to a floorplanner. Many of the major vendors with simulation, synthesis, and place-and-route tools have added some level of support for this format to read or write timing information.

SPEF Standard-parasitic extended format. Part of Open Verilog International's delay-calculation-system (DCS) standard. Based primarily on SPF, SPEF has extended capability and a smaller format. Although many EDA back-end tools support DSPF and RSPF, few EDA tools support SPEF at this time.

SPF Standard-parasitic format. Public-domain format, developed by Cadence, enabling the transfer of instance-specific parasitic capacitances and resistances from physical-design tools to timing-analysis and simulation tools for more accurate timing simulation.


References

  1. Lipman, Jim, "EDA tools let you track and control CMOS power dissipation," EDN, Nov 23, 1995, pg 65.
  2. Napper, Simon, "Technical White Paper on RC Extraction," Epic Design Technology, Sunnyvale, CA, 1995.

Acknowledgments

Thanks to Michael McSherry of Mentor Graphics, Laurie Stanley of Cadence, Camille Aagard of Tsantes, and Georgia Mazsalek for their help in tracking down data-format acronyms. A special thank you to Gary Smith of Dataquest for his enlightening discussions on verification tools and techniques.


You can reach Technical Editor Jim Lipman at (510) 606-1370, fax (510) 606-1563, e-mail ednlipman@mcimail.com.

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