IBM, ASML, TEL Move to 193nm Immersion Litho with Albany NanoTech

Online staff -- Electronic News, 8/26/2004

Albany NanoTech of the University at Albany-State University of New York today announced today that its College for Nanoscale Science and Engineering (CNSE) has installed and begun qualifying for 300mm wafers using the world’s first 193nm pre-production immersion lithography system.

The move will see input from ASML, IBM, and Tokyo Electron Ltd. (TEL), partners of the New York State technology initiative that have provided expertise and resources in immersion lithography to CNSE.

“The technology and expertise from ASML and TEL combined with the research know-how of IBM represent a critical milestone in enhancing Albany NanoTech’s status as an international leader in nanotechnology development and education. Resulting industry-university programs will play a significant role in the strong lithography programs at CNSE, ensuring an unparalleled research capability that will provide immediate scientific and technical solutions to our semiconductor industry customers,” said Alain E. Kaloyeros, VP and chief administrative officer of CNSE and professor of nanoscience at UAlbany, in a statement. 

Under the program, researchers and engineers from CNSE, ASML, IBM and TEL will work jointly on site at Albany NanoTech to demonstrate and optimize materials and processes for emerging 193nm immersion lithography on a clustered 300mm wafer scanner-track platform. The integrated platform consists of two components: the ASML TwinScan AT:1150i scanner, and a Tokyo Electron Limited (TEL) Clean Track Lithius  coater/developer system, the group said.

In addition, as part of their ongoing work with the CNSE, AMD and Infineon also will work with IBM and CNSE in the use of the AT:1150i for the development of immersion lithography processes and applications, it was said.

“This alliance with Albany Nanotech and CNSE allows us to innovate with existing customers AMD, IBM and Infineon, as well as business collaborator TEL, within a world-class university research complex, said Martin van den Brink, executive VP of marketing and technology at ASML, in a statement.  “In the future, the introduction of new technologies will require this type of early collaboration. Teamwork drives equipment suppliers to deliver total solutions and customers to deliver complete equipment applications.”

CNSE and its partners estimate that the market for immersion lithography tools will go from 0 now to $230 million by 2005.