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Scaling: a balanced view, part two
By Joshua Israelsohn, Contributing Technical Editor -- EDN, 5/25/2006
In the last installment of Analog Domain, I began a summary of Klaas Bult's analysis on the effect of technology scaling on power dissipation (reference 1 and reference 2). This column replicates the minimum-circuit model and Bult's Algorithm for reference (figure 1 and figure 2 ). The algorithm depends on three process-dependent quantities and eight application-dependent parameters. It calculates six circuit measures, the last of which is the minimum power dissipation for the minimum circuit. Bult's analysis does hang on a few assumptions, but more than a decade of silicon-process history supports them, as do the foreseeable trends in silicon-process development.
The first value to calculate is the maximum VDD. Ignoring the slight rise in the apparent dielectric strength of ultrathin films compared with thicker film and bulk samples, VDD is essentially proportional to gate-oxide thickness, TOX. TOX, in turn, scales directly with the process's minimum feature size, LMIN, by a ratio that has held essentially constant over process evolutions that saw LMIN decline from 3 microns to 60 nm:
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Setting ηVOL to a reasonable constant value, say 80%, gives the maximum peak-to-peak signal amplitude, VSIG.
The application determines the necessary dynamic range:

where VUNWANTED refers to the various voltage-error terms, including white noise, 1/f noise, and offset.
Though VUNWANTED results from the combination of multiple sources, often in practice one term dominates. As a result, the load-capacitance calculation depends on which term is most important to the application.
Applications that are sensitive to offset voltage require a high degree of device matching. Below the 700-nm node, the minimum capacitance to attain a given degree of matching varies in proportion to1/LMIN. (Calculations are available in Reference 2.) The minimum capacitance for a given dynamic range for circuits in which either white noise or 1/f noise is the dominant consideration varies as 1/LMIN 2. At the 90-nm node, the minimum capacitance for matching is about 200 times larger than the minimum capacitance for white noise, which is about 200 times larger than the minimum capacitance for 1/f noise. For this reason, circuits that demand a high degree of dc accuracy often use device averaging and offset-cancellation techniques.
Given the minimum capacitance that the circuit requires to attain the specified dynamic range, you can calculate the drive current necessary to meet bandwidth, slew-rate, settling-time, and distortion criteria. The next installment of this column will pick up from here.
| Author Information |
| Joshua Israelsohn is director, technical information at International Rectifier Corp and is a contributing technical editor at EDN Worldwide. You can reach him at edn-joshua@mindspring.com. |
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