Cymer’s EUV Laser Pulses 100W

December 3, 2007

One of the stoppers in the march of Moore’s Law is the wavelength of light. We need extreme UV (EUV) “light”—soft x-rays actually—and lots of it to reach down into the IC lithography nodes of 20nm and below. Cymer of San Diego seems to be making some progress in this arena, as reported today by Semiconductor International.

Posted by Steve Leibson on December 3, 2007 | Comments (3)

June 10, 2009

In response to: Cymer’s EUV Laser Pulses 100W
guest commented:

Philips reported there are significant power fluctuations at intermediate focus, more than +/- 10%, at least in the readings.

May 16, 2008

In response to: Cymer’s EUV Laser Pulses 100W
guest commented:

What kind of 25 W ? What counts is collected ? If 25 W total EUV in 2 pi sr then at maximum 1 W collected; if 25 W in 2 pi sr inband than at maximum 8 W collected. This is about the flux ASML's ADT work for weeks.

May 15, 2008

In response to: Cymer’s EUV Laser Pulses 100W
guest commented:

No you don't need shorter wavelength fortunately. The Cymer results are very fishy: "25 W average power" suggesting something very noisy.

About EDN | Site Map | Contact Us | Subscription | RSS

POST A COMMENT
Display Name

Before submitting this form, please type the characters displayed above. Note the letters are case sensitive: