Plasma Etch Introduces a Low Cost Plasma Cleaning System

The PE-50 utilizes a substantial 6"W x 6"D x 4"H Aluminum vacuum chamber for accommodating substrates up to 5"x 5" with 3” of height clearance. The system includes a 125W 50KHz RF power supply provided with continuously variable power capability and is not limited to a few fixed power settings. A 13.56 MHz RF power supply with automatic tuning is an available option. The PE-50 also includes 2 process gas roto-meters for independent gas control or gas mixing introduction to the vacuum chamber and a 5 CFM vacuum pump charged with Fomblin oil for Oxygen compatibility.

Of particular significance, the PE-50 incorporates a PLC control system for automatic process sequencing. A keyboard is used for operator entry and one complete process recipe can be displayed and stored in memory for reliable operation and repeatable results.
Applications include medical devices, solar cells, printed circuit boards, connectors, MEMs, nanotechnology, wafer level packaging as well as many other related semiconductor processes.

For more information: http://www.plasmaetch.com