Executive Q&A

ASML boosts immersion litho performance 7/15/2008

Aimed at 38-nm memory and 32-nm logic semiconductor high-volume manufacturing, Veldhoven, the Netherlands-based lithography giant ASML Holding NV today rolled out its Twinscan XT:1950i lithography system that uses a 1.35 numerical aperture lens, which the company claims increases the performance of its immersion chip lithography systems by 25% by improving overlay, resolution and throughput.

Silicon Genesis’ “kerf-free” wafering technology reduces amount of polysilicon for PV apps 7/11/2008

Meant to substantially reduce the amount of polysilicon used within the ingot-to-wafer manufacturing steps and eliminate some of the costly consumables in today’s wafer manufacturing, San Jose-based semiconductor, display, optoelectronics, and solar engineered substrate process technology provider Silicon Genesis Corp has produced solar substrates for photovoltaic applications using its “kerf-free” wafering process technology called PolyMax.

Voices: Synopsys’ Aart de Geus on investing to win 6/12/2008

EDA leader discusses 'Frankenstein' flows, multicore trends, and the economy's impact on IC design.

Direct-write e-beam system shows major promise for volume production 5/30/2008 7:00:00 PM

In a paper delivered at the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, eShuttle lifts the curtain on a technology shift that could take the e-beam technology far beyond the world of prototyping.

IMEC, Renesas research reconfigurable RF transceivers 5/28/2008

Renesas has joined IMEC's software defined radio front-end program to research new technologies for multi-standard RF transceivers and early realization of next-generation mobile phones.

University working to create nanostructures to raise thin-film solar cell efficiency 5/16/2008

Researchers at the University of California, San Diego led by Professor Edward Yu are working to create thin-film “single junction” solar cells with 45% sunlight-to-electricity conversion efficiencies by using nanostructures that scatter and channel light.

NASA supercomputer to get boost from Intel, SGI 5/8/2008

Intel, SGI, and NASA have announced a project that aims to produce a dramatic increase in the space agency's supercomputing capacity.

AMD revamps server roadmap 5/8/2008

Following feedback from OEMs, microprocessor maker Advanced Micro Devices Inc detailed updates to its server roadmap to “strengthen its alignment with end-customer priorities,” by addressing platform longevity, performance-per-watt and virtualization features according to Randy Allen, AMD corporate VP and general manager for servers and workstations.

IBM develops tiny nanophotonic switch for optical routing between cores 3/17/2008

The move marks another advancement in IBM's quest to develop next-generation high-performance multicore computer chips that transmit information internally using pulses of light through silicon instead of electrical signals on copper wires.

IMEC launches methodology to analyze process variability 3/14/2008

To allow for optimization of system designs for timing, energy and yield versus expected application load, Leuven, Belgium-based nanoelectronics and nanotechnology research center IMEC demonstrated this week a variability-aware modeling flow that analyzes process variability of sub-45-nm technologies.

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